Journal
> Publication > Journal
[International Journal] Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
Hit : 698
Eungtaek Kim+, Choong-Ki Kim+, Myung Keun Lee, Tewook Bang, Yang-Kyu Choi, Sang-Hee Ko Park*, Kyung Cheol Choi*
Applied Physics Letters, May , 2016
Published
vol , no , pp
Abstract
|
